发明名称 |
NICKEL SILICON BASED THIN FILM, NICKEL SILICON BASED MULTI-LAYERED FILM STRUCTURE, AND METHOD FOR MANUFACTURING NICKEL SILICON BASED THIN FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a new nickel silicon thin film whose physical characteristics never deteriorate even when used at a high temperature and a manufacturing method therefor. SOLUTION: On a silicon substrate 1, a silicon and carbon containing base film 2 and a nickel containing thin film 3 are formed in order by using a known filming method to form a multi-layered structure 5. Then this multi-layered structure 5 is heat-treated for mutually diffusing silicon elements in the silicon substrate 1, silicon elements and carbon elements in the base film 2, and nickel elements in the nickel containing thin film 3 and subject them to chemical reaction, thereby manufacturing the nickel silicon based thin film 6 containing carbon. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004040013(A) |
申请公布日期 |
2004.02.05 |
申请号 |
JP20020198369 |
申请日期 |
2002.07.08 |
申请人 |
UNIV NAGOYA |
发明人 |
ZAIMA SHIZUAKI;YASUDA YUKIO;SAKAI AKIRA;NAKATSUKA OSAMU;TSUCHIYA YOSHINORI |
分类号 |
H01L21/28;H01L21/3205;H01L23/52;(IPC1-7):H01L21/28;H01L21/320 |
主分类号 |
H01L21/28 |
代理机构 |
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