| 摘要 |
PROBLEM TO BE SOLVED: To improve the corrosion resistance to plasma; and to provide a plasma resistant member which can be suitably used as a member of a chamber, a chamber liner, a shower plate, a baffle-plate or an electrode used in an apparatus for dry process for manufacturing a semiconductors or a liquid crystal. SOLUTION: The plasma resistant member is characterized in that the compressive stress to an yttria film formed on the surface of a base material formed from aluminum, stainless steel or aluminum nitride is nearly zero. Such a plasma resistant member is manufactured by forming a layer of a ceramic material such as yttria on the base material by detonation flame spray or water stabilization thermal spray, and then forming a thin film of a plasma resistant material as a surface layer. COPYRIGHT: (C)2004,JPO
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