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发明名称
ACID ETCHING MIXTURE HAVING REDUCED WATER CONTENT
摘要
<p>Acid etching mixtures having water content, reduced by the addition of fluorosulfonic acid. The preparation and the use of said acid etching mixtures, particularly in etching silicon, are also disclosed.</p>
申请公布号
WO2003107400(P1)
申请公布日期
2003.12.24
申请号
US2003019079
申请日期
2003.06.18
申请人
发明人
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主分类号
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