| 发明名称 |
Method of cleaning electronic device and method of fabricating the same |
| 摘要 |
An electronic device having a component containing a refractory metal such as tungsten is cleaned by using a cleaning solution composed of an acidic solution which does not substantially contain aqueous hydrogen peroxide or an alkaline solution which does not substantially contain aqueous hydrogen peroxide.
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| 申请公布号 |
US6664196(B1) |
申请公布日期 |
2003.12.16 |
| 申请号 |
US20000526174 |
申请日期 |
2000.03.15 |
| 申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
WADA YUKIHISA;MATSUMOTO MICHIKAZU |
| 分类号 |
H01L21/02;H01L21/3213;H01L21/8238;(IPC1-7):H01L21/302 |
主分类号 |
H01L21/02 |
| 代理机构 |
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代理人 |
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