| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide equipment for a plasma process for improving the uniformity of the plasma process without increasing the output of a necessary power source. <P>SOLUTION: The equipment for the plasma process comprises process chambers 1, 2 for processing with plasma and three or more electromagnetic wave-guiding means 4a-4d, 5a-5d, and 6a-6d connected to the chambers 1, 2 for guiding electromagnetic waves into the chambers in order to generate plasma with reactive gases supplied into the chambers 1, 2. In the area adjacent to the process chambers, each distance X1 between the means 4b and 4c, 5b and 5c, 6b and 6c in one combination out of combinations of adjacent two means 4a-4d, 5a-4d, 6a-6d is different from the distance X2 between the adjacent means 4a and 4b, 5a and 5b, and 6a and 6b in the other combination. <P>COPYRIGHT: (C)2004,JPO |
