发明名称 Method of making a lamination and surface planarization for multilayer thin film interconnect
摘要 A method of making a surface planarization is provided using a separate pre-cut or precured film laminated onto a metallized surface to form planarized dielectric coating. The method comprises the steps of: (a) providing a thin film interconnect module with a polyimide adhesive laminated with a pre-cut or pre-cured polyimide lamination film on the top of the polyimide adhesive, the polyimide lamination film being covered with a glass plate; (b) applying pressure and heat in a synchronized format to ensure a uniform curing and gap filling in the thin film module metal for the adhesive layer; and (c) releasing the glass plate to expose a smooth lamination film surface.</PTEXT>
申请公布号 US6632314(B1) 申请公布日期 2003.10.14
申请号 US19990474189 申请日期 1999.12.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 YU RONGQING;KELLY KIMBERLEY A.;PRASAD CHANDRIKA;KANG SUNG KWON;PURUSHOTHAMAN SAMPATH
分类号 H01L21/48;H05K3/28;H05K3/46;(IPC1-7):B32R31/00 主分类号 H01L21/48
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