| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor layer manufacturing method for restraining damages in a mask with low-output laser energy density, and to provide a semiconductor layer manufacturing system using the semiconductor layer manufacturing method. <P>SOLUTION: In the semiconductor layer manufacturing method, a semiconductor is irradiated with a laser for manufacturing the semiconductor layer. The semiconductor layer manufacturing method includes a process for exposing the mask to a laser beam, a process for irradiating the laser beam which passes through the mask by a multiple of 1, and a process for summing first energy density and second density for hearing a specific region in the semiconductor by a process for exposing a specific region in the semiconductor to the irradiated laser beam having the first energy density and by a process for exposing a specific region in the semiconductor to lamp light having the second energy density. <P>COPYRIGHT: (C)2004,JPO</p> |
