| 摘要 |
PROBLEM TO BE SOLVED: To control variation of electron trajectory near a spacer accompanying a prolonged drive. SOLUTION: If a maximum inclination angleθof an irregular slant face on a surface of a spacer substrate 1 is larger than 80°, a place equivalent to a substrate angle of 80°or larger is partly produced, the resistance of a high resistance film 2 is eventually increased and an electric charge is accumulated in the spacer substrate 1 accompanying the prolonged drive when the high resistance film 2 is produced. As a result, the variation of the electron orbit accompanying the prolonged drive can be controlled, since an increase in the resistance of the spacer can be prevented by setting the maximum inclination angleθof thee spacer's slant face forming irregularity at 80°or smaller. COPYRIGHT: (C)2003,JPO
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