发明名称 SUBSTRATE DRIER
摘要 PROBLEM TO BE SOLVED: To provide a substrate drier capable of forming a functional film of constant thickness on the upper surface of a substrate. SOLUTION: The substrate drier heats and dries a solution applied on the upper surface of a substrate W to form a functional film. It comprises an arrangement body 1 in which, having a space 6, a plurality of ventilation holes 5 extending from the space to the upper surface are formed, a supply pipe 9 which supplies a hot blast to the upper surface side of the arrangement body through the space from the ventilation holes, a support frame member 7 which, provided on the upper surface of the arrangement body, supports the peripheral part of the substrate W, and an exhaust opening 13 which exhausts the hot blast supplied to the upper surface side of the arrangement body from the supply pipe, through the upper surface side of the arrangement body. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003188077(A) 申请公布日期 2003.07.04
申请号 JP20010386424 申请日期 2001.12.19
申请人 SHIBAURA MECHATRONICS CORP 发明人 MATSUSHIMA DAISUKE;YAMAZAKI TAKAHIRO
分类号 G02F1/13;F26B3/04;F26B21/00;G02F1/1333;G03F7/38;H01L21/027;(IPC1-7):H01L21/027;G02F1/133 主分类号 G02F1/13
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