| 发明名称 |
DEVELOPING SOLUTION FOR PHOTORESIST |
| 摘要 |
A novel developing solution for photoresists which contains an alkali builder, a fluorine-free surfactant which is a phosphonic acid or phosphate, and a fluorinated surfactant.
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| 申请公布号 |
WO03052519(A1) |
申请公布日期 |
2003.06.26 |
| 申请号 |
WO2002JP13103 |
申请日期 |
2002.12.13 |
| 申请人 |
SHIPLEY COMPANY, L.L.C.;KANDA, TAKASHI;KONDO, MASAKI |
发明人 |
KANDA, TAKASHI;KONDO, MASAKI |
| 分类号 |
G03F7/038;G03F7/32;H01L21/027;H01L21/311;(IPC1-7):G03F7/32 |
主分类号 |
G03F7/038 |
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