| 发明名称 |
Polymers, resist compositions and patterning process |
| 摘要 |
Polymers comprising recurring units of fluorinated maleic anhydride and/or fluorinated maleimide are novel. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.
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| 申请公布号 |
US6579658(B2) |
申请公布日期 |
2003.06.17 |
| 申请号 |
US20010783446 |
申请日期 |
2001.02.15 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;WATANABE JUN;HARADA YUJI |
| 分类号 |
G03F7/00;C08F222/04;G03F7/004;G03F7/039;(IPC1-7):G03C1/492 |
主分类号 |
G03F7/00 |
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