PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A plasma processing apparatus is provided to facilitate adjustment of impedance matching and improve stability of a plasma discharge stage by finely controlling the capacitance of a load capacitor when the impedance of a matching circuit varies. CONSTITUTION: The matching circuit(2A) is prepared for impedance matching between a radio-frequency generator and a plasma processing chamber(CN). One or a plurality of impedance converting circuits are provided between the matching circuit and the radio-frequency generator. The impedance converting circuit converts an impedance to decrease a difference in impedance to be matched by the matching circuit, thereby decreasing a change in the output impedance with a moving amount of a capacitance control of one of variable passive elements of the matching circuit, such as a load capacitor and a tuning capacitor.