| 摘要 |
PURPOSE: Deposition equipment is provided to be capable of simultaneously processing a plurality of substrates by using a plurality of reactors in a single reaction chamber. CONSTITUTION: A chamber(C) is provided and encapsulated with a chamber cover(100), a chamber wall, and a bottom plate(130). A plurality of upper bodies(110a,110b,110c) of a reactor are fixed on the inner portion of the chamber cover(100). A plurality of lower bodies(120a,120b,120c) of the reactor are installed on the bottom plate(130), wherein the lower bodies(120a,120b,120c) of the reactor are capable of moving up and down. At this time, at least two reactors are installed in the chamber(C) by connecting the upper and lower bodies with each other. A plurality of support pins(106a,160b,160c) are inserted and installed in the lower bodies for supporting a substrate when the lower body moves down. A substrate exit(140) is formed on the chamber wall for supplying the substrate.
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