发明名称 |
METHOD FOR FABRICATING FIELD EFFECT TRANSISTOR USING SUPERCONDUCTOR |
摘要 |
PURPOSE: A method for fabricating a field effect transistor using a superconductor is provided to remove metallic components in an Al2O3 insulation layer on MgB2 superconductor to improve the quality of electrical insulation by performing thermal process. CONSTITUTION: A MgB2 superconducting layer is deposited on a substrate(10) and a mask is formed on the whole surface of it. The superconductor layer is etched to form a superconducting layer pattern by using the photoresist pattern made by performing photolithography on the mask. After removing the mask, A source and drain electrode(13) are deposited on the superconducting layer pattern(11). An Al2O3 insulation layer(14) is deposited on the resultant structure. A gate oxide(15) is deposited on the insulation layer. The insulation layer is thermally processed under 300-400 degree C.
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申请公布号 |
KR20030029748(A) |
申请公布日期 |
2003.04.16 |
申请号 |
KR20010062442 |
申请日期 |
2001.10.10 |
申请人 |
LG ELECTRONICS INC. |
发明人 |
AHN, JUN HYEONG;CHOI, HONG SEOK;KYE, JEONG IL;MUN, SEUNG HYEON |
分类号 |
H01L39/22;(IPC1-7):H01L39/22 |
主分类号 |
H01L39/22 |
代理机构 |
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地址 |
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