A method of a single wafer wet/dry cleaning apparatus comprising: a transfer chamber having a wafer handler contained therein; a first single wafer wet cleaning chamber directly coupled to the transfer chamber; and a fist single wafer ashing chamber directly coupled to the transfer chamber.
申请公布号
WO03021642(A2)
申请公布日期
2003.03.13
申请号
WO2002US27573
申请日期
2002.08.28
申请人
APPLIED MATERIALS, INC.
发明人
VERHAVERBEKE, STEVEN;TRUMAN, J., KELLY;LANE, CHRISTOPHER, T.;SOMEKH, SASSON, R.
