发明名称 PHOTOSENSITIVE RESIN FOR LIQUID CRYSTAL SPACER AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin which has high photo-setting properties, with which a liquid crystal spacer excellent in characteristics such as mechanical strength can be formed and to which alkali development properties can be imparted without sacrificing the photo-setting properties, for the purpose of providing a columnar spacer by which the interval between surface flat bodies of a liquid crystal cell can be regularly controlled and maintained for a long time, in a large size liquid crystal display device, and to provide a resin composition. SOLUTION: The photosensitive resin for forming the liquid crystal spacer for regularly maintaining the interval of the surface flat bodies, in the liquid crystal cell wherein a liquid crystal composition is encapsulated between the two surface flat bodies separated at a regular interval from each other, can be characteristically obtained in such a manner that an epoxy resin containing epoxy resin having two epoxy groups in one molecule as the essential component is reacted with an unsaturated monobasic acid, successively with a polybasic acid anhydride and resultingly formed carboxyl groups sre reacted with a compound having two or more functional groups which can be reacted with the carboxyl groups in one molecule.
申请公布号 JP2003015136(A) 申请公布日期 2003.01.15
申请号 JP20010196186 申请日期 2001.06.28
申请人 NIPPON SHOKUBAI CO LTD 发明人 OTSUKI NOBUAKI
分类号 G02F1/1339;C08G59/14;C08G59/42 主分类号 G02F1/1339
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