SYSTEMS AND METHODS FOR INSPECTION OF TRANSPARENT MASK SUBSTRATES

摘要

A method for detecting an anomaly (104) on a first surface of a transparent substrate starts with providing a transparent substrate (300) that has a reflective second surface (304). The method then comprises directing a radiation beam (100) at the first surface of the substrate so that at least a portion (110) of the radiation penetrates the substrate (300) and strikes the reflective second surface(304). This radiation is reflected back as a reflected radiation beam (306) through the first surface of the substrate. The method then comprises detecting radiation (200) from the reflected radiation beam. This method can further comprise causing relative motion between the radiation beam (100) and the first surface of the substrate (300). This method can also further comprise documenting the presence of an anomaly if the detected radiation shows that the reflected radiation beam was scattered upon traversing the first surface.