| 摘要 |
<p>Methods and devices are disclosed for use in holding mirrors as used in any of various X-ray optical systems. In this context, "X-ray" encompasses the so-called "soft X-ray" or "EUV" wavelengths. The X-ray optical systems can be used, for example, in EUV microlithography systems. A fluid cavity (e.g., an elastic toroidal ring) extends around the circumference of an X-ray mirror. The cavity defines a lumen that is filled with a fluid. The fluid can be static or flowing, and can be a gas or liquid. Holding members are disposed evenly spaced around the circumference of the cavity. Thus, any stress imparted to the mirror by holding is distributed evenly around the circumference of the mirror.</p> |
