发明名称 |
MANUFACTURING MEANS FOR INTERFERENCE FILTER, INTERFERENCE FILTER, MANUFACTURING MEANS FOR WAVELENGTH VARIABLE INTERFERENCE FILTER, WAVELENGTH VARIABLE INTERFERENCE FILTER, AND WAVELENGTH SELECTIVE FILTER |
摘要 |
PROBLEM TO BE SOLVED: To provide an interference filter and its manufacturing means by which the distance between reflection films can be made constant in a plane even for a curved surface, to provide a wavelength variable interference filter and its manufacturing means by which the distance in the reflection films can be varied, to provide a wavelength selective filter which emits RGB lights in time series, and to provide a wavelength selective filter for communications having extremely high wavelength separation accuracy. SOLUTION: Such manufacturing means that reflection films with high reflectance, which are damaged at high temperature can be used and that no damage is given to thin films or optical members when a sacrificial layer is removed, can be obtained by depositing an amorphous silicon sacrificial layer between reflection films and then removing the layer with xenon fluoride gas. The wavelength variable interference filter which can control the transmission wavelength by voltage can be realized by the combination of the above processes and by fabricating electrostatic and piezoelectric actuators. |
申请公布号 |
JP2002243937(A) |
申请公布日期 |
2002.08.28 |
申请号 |
JP20010037511 |
申请日期 |
2001.02.14 |
申请人 |
SEIKO EPSON CORP |
发明人 |
TAKEDA TAKASHI |
分类号 |
G02B26/00;B81B3/00;B81C1/00;C23C16/24;G02B5/28;(IPC1-7):G02B5/28 |
主分类号 |
G02B26/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|