| 摘要 |
PURPOSE:To set an exposure waiting time to the optimum value relative to deflection distance, by determining by calculation whichever larger one of distances in directions X and Y between exposure regions, and also by making selective output of picturing commencement waiting time in accordance with thus calculated output. CONSTITUTION:When exposure of electronic beam to an exposure region ended, exposure data are transferred from a memory 2 to a resistor 5 at DMA mode by control of a processor 1. These exposure data are composed of scanning commencement X-Y coordinate scanning end X-Y coordinate of the exposure region, and by this, a deflection control unit 6 deflects electronic beam and draws a pattern on a substrate 10. By determining large and small between distances DELTAX and DELTAY, the waiting time is set in relation to the larger distance. |
