发明名称 Planar magnetron sputtering apparatus
摘要 A magnet assembly for magnetron sputtering includes a base pole member defining a plane and formed of magnetically permeable material. A center primary magnet is positioned on the base pole member and has its north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member. An outer primary magnet is positioned on the pole member and has a north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member and in a direction opposite to the magnetic orientation of the center primary magnet. A center secondary magnet is positioned between the center primary magnet and the outer primary magnet and has a north-south magnetic orientation extending substantially perpendicular to the plane of the base pole member and in a direction opposite to the magnetic orientation of the center primary magnet.
申请公布号 US6432285(B1) 申请公布日期 2002.08.13
申请号 US20000687317 申请日期 2000.10.13
申请人 CIERRA PHOTONICS, INC. 发明人 KASTANIS WILLIAM P.;WESCOTT M. ELIZABETH
分类号 H01J37/34;(IPC1-7):C23C14/35 主分类号 H01J37/34
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