| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for measuring contamination of a sample in an electron beam tester capable of quantitatively measuring the amount of contaminated deposits adhering on the viewing plane of the electron beam tester. SOLUTION: An electron beam B1 from an electron gun 7 in an electron gun room 1 irradiates the sample 16 disposed in a sample room 4, and secondary electrons B2 generated by the sample are detected. Thereby, the electron beam tester measures the dimension of the sample. Using this tester, the electron beam irradiates a projection or a recess formed on the surface of the sample 16, and the amount of the contaminated deposits is measured from the dimension of the projection or the recess being changed by the contaminated deposits adhering on the plane which the electron beam irradiated.</p> |
