发明名称 |
Device and method for the inspection of the condition of a sample |
摘要 |
The invention relates to the reflectometric analysis of samples. As opposed to conventional methods where a very small area of the sample is analyzed by irradiation by means of focused radiation and the reflected radiation is measured by position-sensitive detection, the invention utilizes a parallel or a diverging beam so as to irradiate a larger area of the sample simultaneously and also utilizes position-sensitive and energy-sensitive detection so as to derive information concerning a plurality of spots of the irradiated area of the sample at the same time.
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申请公布号 |
US2002085669(A1) |
申请公布日期 |
2002.07.04 |
申请号 |
US20010988844 |
申请日期 |
2001.11.19 |
申请人 |
DE BOER DIRK KORNELIS GERHARDUS;VAN LOENEN EVERT JAN |
发明人 |
DE BOER DIRK KORNELIS GERHARDUS;VAN LOENEN EVERT JAN |
分类号 |
G01N23/201;G01N23/20;(IPC1-7):G01T1/36 |
主分类号 |
G01N23/201 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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