发明名称 Device and method for the inspection of the condition of a sample
摘要 The invention relates to the reflectometric analysis of samples. As opposed to conventional methods where a very small area of the sample is analyzed by irradiation by means of focused radiation and the reflected radiation is measured by position-sensitive detection, the invention utilizes a parallel or a diverging beam so as to irradiate a larger area of the sample simultaneously and also utilizes position-sensitive and energy-sensitive detection so as to derive information concerning a plurality of spots of the irradiated area of the sample at the same time.
申请公布号 US2002085669(A1) 申请公布日期 2002.07.04
申请号 US20010988844 申请日期 2001.11.19
申请人 DE BOER DIRK KORNELIS GERHARDUS;VAN LOENEN EVERT JAN 发明人 DE BOER DIRK KORNELIS GERHARDUS;VAN LOENEN EVERT JAN
分类号 G01N23/201;G01N23/20;(IPC1-7):G01T1/36 主分类号 G01N23/201
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