发明名称 Laser irradiation apparatus
摘要 An object is to obtain an even energy distribution of a laser beam in one direction, thereby conducting a uniform laser annealing on a film.A laser irradiation apparatus comprising: a lens for dividing a laser beam in one direction; and an optical system for overlapping the divided laser beam, characterized in that the shape of the laser beam entering into the lens has edges vertical to the above-mentioned direction.
申请公布号 US6414981(B1) 申请公布日期 2002.07.02
申请号 US20000481396 申请日期 2000.01.12
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TANAKA KOICHIRO
分类号 H01L21/26;B23K26/06;B23K26/067;B23K26/073;G02B27/09;H01S3/0941;(IPC1-7):H01S3/10;H01S3/22;H01S3/08;H01L21/00 主分类号 H01L21/26
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