发明名称 |
Laser irradiation apparatus |
摘要 |
An object is to obtain an even energy distribution of a laser beam in one direction, thereby conducting a uniform laser annealing on a film.A laser irradiation apparatus comprising: a lens for dividing a laser beam in one direction; and an optical system for overlapping the divided laser beam, characterized in that the shape of the laser beam entering into the lens has edges vertical to the above-mentioned direction.
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申请公布号 |
US6414981(B1) |
申请公布日期 |
2002.07.02 |
申请号 |
US20000481396 |
申请日期 |
2000.01.12 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
TANAKA KOICHIRO |
分类号 |
H01L21/26;B23K26/06;B23K26/067;B23K26/073;G02B27/09;H01S3/0941;(IPC1-7):H01S3/10;H01S3/22;H01S3/08;H01L21/00 |
主分类号 |
H01L21/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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