发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To improve outward appearance quality and to lower a cost. SOLUTION: After resin sealing, a lead 1a on the backside 3a of a sealing part 3 is irradiated with laser light to remove resin burrs 8 and expose a connected surface 1g of the lead 1a, thereby improving the outward appearance quality of QFN and lowering the cost.</p>
申请公布号 JP2002184795(A) 申请公布日期 2002.06.28
申请号 JP20000380048 申请日期 2000.12.14
申请人 HITACHI LTD;HITACHI YONEZAWA ELECTRONICS CO LTD 发明人 SHIMANUKI YOSHIHIKO;KOBAYASHI SHOICHI
分类号 H01L23/12;H01L21/56;H01L23/00;(IPC1-7):H01L21/56 主分类号 H01L23/12
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