发明名称 |
Method for fabricating a semiconductor device having different gate oxide layers |
摘要 |
A method for fabricating a semiconductor device with different gate oxide layers. Oxidation is controlled in accordance with the active area dimension so that oxide grows thin at a wider active width (peripheral region) and grows thickly at a narrower active width (cell array region). A gate pattern is formed on a semiconductor substrate having different active areas. Gate spacers are formed and then active dimension dependent oxidation process is performed to grow the oxide layers differently from one another.
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申请公布号 |
US6329249(B1) |
申请公布日期 |
2001.12.11 |
申请号 |
US19990333574 |
申请日期 |
1999.06.15 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YANG WON-SUK;KIM KI-NAM;SIM JAI-HOON;LEE JAE-KYU |
分类号 |
H01L21/82;H01L21/8234;H01L21/8242;H01L27/088;H01L27/108;(IPC1-7):H01L21/823 |
主分类号 |
H01L21/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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