| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable material excellent in the scuffing resistance of the film surface, excellent also in fog reducing properties and properties of preventing printout after development as photographic performances, giving a processed film whose surface is less liable to stain even in development processes repeated many times and not causing the contamination of a heat drum or a heat roller in a processing machine in which heat development is carried out and to provide a method for developing the material. SOLUTION: In the heat developable material with a photosensitive layer containing photosensitive silver halide grains, an organic silver salt, a reducing agent and a binder and a protective layer containing a fluorine compound, a matting agent and a binder on the base, the binder in the photosensitive layer or the protective layer is cured in the presence of a compound of formula (1) or (2).
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