| 摘要 |
PROBLEM TO BE SOLVED: To provide an observation method and system for allowing the observa tion of the structure of one construction object to be observed in different directions for one sample. SOLUTION: A sample 31 for an electron microscope is stood upright on a sample pedestal 6 rotatable around a rotation axis Q. A sample base body 1A for the sample 31 for the electron microscope is prepared by cutting out 0.1μm square covering a microscopic structure by means of FIB processing from the front surface of the semiconductor substrate to the rear surface. On the tip thereof there is formed a square-pole-shaped sample area 2 for three- dimensional observation for allowing the observation of the microscopic structure 7 to be observed. An object lens 3 is disposed so that an electron beam 5 is shot perpendicular to a side surface parallel to a direction where the sample pedestal 6 for the electron microscope is stood upright. A detector 4 is disposed in a position where a secondary electron 52 discharged from the sample region 2 for a three-dimensional observation can be detected if an electron beam 5 is shot on the side of the sample region 2 for observation.
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