| 摘要 |
PROBLEM TO BE SOLVED: To provide a porous dielectric material of low permitivity useful in electronic component industry and a method of manufacturing it. SOLUTION: The method of manufacturing a porous dielectric material comprises following steps: a) disperse removable polymeric porogen into a dielectric material of the B-step b) harden the B-step dielectric material to form a dielectric matrix material without substantially dissolving porogen c) obtain a porous dielectric material, substantially soluble with the B-step dielectric material, including a step to remove porogen at least partially for providing favorable condition to form a porous dielectric material without dissolving the dielectric matrix material actually the dielectric material.
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