发明名称 PLASMA PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain a device where active oxygen produced by plasma is introduced efficiently in the region reacting with an object to be measured without scattering of the object to be processed. SOLUTION: Matters to be processed 3 are placed on a processing tray 4 inside a cylindrical processing vessel 2, the inside of the processing vessel 2 is made to be a specific gas atmosphere by depressurization operation through an exhaust piece 8 and introducing gas from the gas introduction hole 5, a plasma 1 is generated by a high frequency induction coil 7 arranged by way of an electric insulation window 11 in the upper part of the processing vessel 2, and matters to be processed 3 are processed with the generated active oxygen, for asking and volume reduction. In the inner wall of the processing vessel 2 positioning at the height between the lower end of the window 11 and the upper end of the processing plate 4, a plurality of gas introducing hole 5 are almost uniformly arranged.
申请公布号 JP2001153998(A) 申请公布日期 2001.06.08
申请号 JP19990372199 申请日期 1999.12.28
申请人 FUJI ELECTRIC CO LTD 发明人 IZUMI SHUNSUKE;KOGUCHI MAKOTO;KATAGIRI GENICHI;SAKAKIBARA YASUSHI;YAGINUMA SADAHIRO;NAGATOMO SUMI
分类号 G21F9/30;G21F9/32;H05H1/46 主分类号 G21F9/30
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