发明名称 |
SOLID STATE IMAGE SENSOR AND METHOD OF FABRICATION THEREOF |
摘要 |
PURPOSE: Provided are a solid state image sensor in which vertical charge transfer efficiency is prevented from deteriorating due to short channel effect, and a method for fabricating such a solid state image sensor. CONSTITUTION: A vertical charge transfer path(205) includes a part(region A) defined by an isolation region(202) on the opposite sides, and a part(region B) defined by the isolation region(202) only on one side. Impurity concentration of the isolation region(202a) defining the opposite sides is set lower than that of the isolation region(202b) defining one side by such a degree as short channel effect is reduced in the vertical charge transfer path(205) at the part defined by the isolation region(202) on the opposite sides.
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申请公布号 |
KR20010040014(A) |
申请公布日期 |
2001.05.15 |
申请号 |
KR20000058694 |
申请日期 |
2000.10.06 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TOMA TETSUO |
分类号 |
H01L27/146;H01L27/148;(IPC1-7):H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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