摘要 |
PURPOSE: An apparatus for manufacturing a semiconductor having a cooling apparatus in a load lock chamber is provided to prevent a wafer defect, by cooling a process-completed wafer in a load lock chamber without using a separate cooling chamber so that the wafer does not stagnate in a process module. CONSTITUTION: A plurality of load ports is loaded with a wafer. A front end system(200) includes an ATM robot(202) and an ATM aligner(204). The ATM robot transfers the wafer loaded in the plurality of load ports in a non-contaminated space in an atmospheric state. The ATM aligner aligns a position of the transferred wafer by the ATM robot. A plurality of load lock chambers(300,302) include a cassette, a storage elevator and a cooling apparatus, located in the center of a main frame of a system. The ATM robot carries the cassette until the wafers in the first and second load ports(100,102) are completely transferred, and performs a cooling operation after the process-completed wafer is loaded in the cassette. A vacuum transfer chamber(400) transfers a wafer to a process chamber, and has a vacuum robot(402) for transferring the process-completed wafer to the plurality of load lock chambers. The first, second, third and fourth process modules perform a process regarding the transferred wafer(502,504,506,508).
|