发明名称 ASSEMBLY FOR WAFER HANDLING APPARATUS
摘要 PROBLEM TO BE SOLVED: To obtain an opening array of a blade which greatly reduces the thermal gradient growing in a high temp. wafer. SOLUTION: A blade assembly 24 for mechanical wafer handlers comprises a thin and long plane member having a center region having a first and second opening arrays. The openings of the first array extend along the length of the plane member and are disposed approximately symmetrically to the openings of the second array against the lengthwise center axis passing the center point of the center region. The openings of the first array extend along the width of the plane member and are disposed approximately symmetrically to the vertical axis passing the center point of the center region. The openings of the second array are disposed approximately symmetrically to the vertical axis. The assembly 24 comprises a wrist 26 having a wrist upper cap and a wrist lower cap.
申请公布号 JP2001035903(A) 申请公布日期 2001.02.09
申请号 JP20000158534 申请日期 2000.05.29
申请人 APPLIED MATERIALS INC 发明人 MINNICK ANDREW;WILSON JAMES;MAYUR ABHILASH J
分类号 B65G49/07;B25J15/08;H01L21/677;H01L21/68;H01L21/687;(IPC1-7):H01L21/68 主分类号 B65G49/07
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