发明名称 Crystal glass composition used In the production of ICs and LSIs comprises a main component represented by silicon dioxide, magnesium oxide and aluminum oxide, and boron oxide
摘要 Crystal glass composition comprises a main component represented by x SiO2 + y MgO + z Al2O3 (where x + y + z = 100 wt. pts., and x, y and z lie on lines or in the region enclosed by the lines running through the points A (44.0, 55.0, 1.0), B(34.5, 64.5, 1.0), C (35.0, 30.0, 35.0) and D (44.5, 30.0, 25.5) on a ternary diagram), and 2-20 wt. pts. B2O3. An Independent claim is also included for a circuit substrate comprising a insulating layer produced by calcining the crystal glass composition, and a circuit pattern of a silver-containing conducting material, a copper-containing conducting material and a gold-containing conducting material.
申请公布号 DE10031950(A1) 申请公布日期 2001.01.25
申请号 DE2000131950 申请日期 2000.06.30
申请人 MURATA MFG. CO., LTD. 发明人 KAWAKAMI, HIROMICHI;TANAKA, TOSHIKI;WATANABE, SHIZUHARU;TAKAGI, HIROSHI
分类号 H05K1/03;C03C3/064;C03C3/091;C03C4/00;C03C10/04;C03C10/08;(IPC1-7):C03C3/091 主分类号 H05K1/03
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