BLACK DEFECT CORRECTION METHOD AND BLACK DEFECT CORRECTION DEVICE FOR PHOTOMASK

摘要

When a dot matrix whose one dot corresponds to the spot of an ion beam on a treated surface is set on the treated surface and an ion beam is applied to each dot in a treatment region for a certain time to eliminate a black defect, the existence of secondary charged particles, which are emitted from a plurality of dots including a dot in question and dots around the dot and indicate the existence of the black defect, is detected and, in accordance with those detection information, a physical value corresponding to the existence of the black defect is calculated. When the calculated value is reduced to a value not larger than a reference value, it is judged that the treatment of the dot in question has been finished.