发明名称 METHOD FOR ADJUSTING FREQUENCY OF SURFACE ACOUSTIC WAVE DEVICE
摘要 PROBLEM TO BE SOLVED: To highly precisely adjust a frequency by forming a polymer film on a surface wave substrate and adjusting the film of the polymer film. SOLUTION: A polymer film 6 is formed on a surface wave substrate 2, the film thickness of the polymer film 6 is adjusted and therefore a frequency is adjusted. An end face reflection-type surface wave resonator 1 is constituted by using a rectangular surface wave substrate 2. The relative dielectric constantεS/εO of the surface wave substrate 2 is necessary to be not less than 30 and an electric/mechanical connection coefficient K to be not less than 20%. For adjusting the frequency of the end face reflection-type surface wave resonator 1, the polymer film (polyimide film) 6 is formed on the surface wave substrate 2. Namely, a resonance frequency is adjusted by adjusting the thickness of the polyimide film 6. It is desirable that the relative dielectric constant of the polymer film 6 is smaller than that of the surface wave substrate 2, the polyimide film is suitably used but the film formed of the polymer of polyamide can be formed.
申请公布号 JP2000278068(A) 申请公布日期 2000.10.06
申请号 JP20000006640 申请日期 2000.01.14
申请人 MURATA MFG CO LTD 发明人 KADOTA MICHIO;KONDOU CHIKAFUMI;AGO JUNYA;HORIUCHI HIDEYA;ITO YOSHIHIRO;OKAMOTO YOSHINOBU
分类号 H03H3/10;H03H9/145;H03H9/25;(IPC1-7):H03H3/10 主分类号 H03H3/10
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