| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate inspection apparatus by which a defect can be inspected with high accuracy, and to provide an oblique illumination unit. SOLUTION: In this substrate inspection apparatus, by a first line illumination part 14 which is installed so as to be relatively movable to a substrate 12 to be inspected, line illumination in a direction at a right angle to the movement direction of the substrate 12 to be inspected in made incident at a prescribed angle with respect to the movement direction of the substrate 12 to be inspected. In addition, by a second line illumination part 15 which is installed so as to be relatively movable to he substrate 12, to be inspected, together with the first line illumination part 14, line illumination in a direction at a right angle to the movement direction of the substrate 12 to be inspected is made incident at a prescribed angle with respect to the direction at right angles to the movement direction of the substrate 12 to be inspected. Reflected light in a linelike region on the substrate 12, to be inspected, which is illumination by the first and second line illumination parts 14, 15 is fetched by a one-dimensional image sensor 16.
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