发明名称 ELECTRON BEAM PHYSICAL VAPOR DEPOSITION DEVICE
摘要 PROBLEM TO BE SOLVED: To particularly improve the conditions of sticking efficiency and peeling resistance in a sticking method for a heat insulating film. SOLUTION: This device is for sticking a ceramic film by an electron beam physical vapor deposition method(EBPVD). Though ceramic is stuck from a trap of molten ceramic, by increasing the dimensions of the trap 114 of molten ceramic, a ceramic film having more uniform thickness is stuck over a wider surface range. In this device, a crucible part 112 surrounding ceramic substance 10 to be made into a feeding source of the ceramic film to be stuck is used. This crucible 112 is composed so as to form the trapping part 118 of the cross section wider than the cross section of the ceramic substance 10. For maintaining the quality of an ingot in accordance with the standard, the size of the trap 114 is increased by the increase of the dimensions of the trapping part 118 instead of the increase of the diameter of the ceramic substance 10.
申请公布号 JP2000212734(A) 申请公布日期 2000.08.02
申请号 JP19990338915 申请日期 1999.11.30
申请人 GENERAL ELECTRIC CO <GE> 发明人 BRUCE ROBERT W;EVANS JOHN DOUGLAS SR
分类号 C23C14/24;C23C14/30;(IPC1-7):C23C14/30 主分类号 C23C14/24
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