发明名称 MAGNETRON SPUTTERING DEVICE
摘要 PROBLEM TO BE SOLVED: To obtain a high quality thin film of low resistance and low stress at a low cost by using gaseous neon as sputtering gas and jointly providing a cryopump and a turbo-molecular pump as exhausting apparatuses. SOLUTION: On the inside of a vacuum vessel 20, a target 10 and a substrate 12 are oppositely arranged, and the vacuum vessel 20 is fitted with two kinds of exhausting apparatuses of a cryopump 25 having a stop valve 26 and a turbo-molecular pump 23 having a stop valve 21. Moreover, neon as plasma discharge gas is fed from a bomb 22, its flow rate is controlled by a mass controller 24, and it is introduced into the vacuum vessel 20. Gaseous neon is exhaused mainly by the turbo-molecular pump 23, the pressure in the vacuum vessel 20 is held to a certain one by the balance of the exhausting performance between the mass flow controller 24 and the turbo-molecular pump 23, and the cryopump 25 exhausts oxygen, nitrogen, water vapor or the like and hardly exhausts gaseous neon. In this way, the flow rate of gaseous neon is made small, and the cost can be reduced.
申请公布号 JP2000160337(A) 申请公布日期 2000.06.13
申请号 JP19980338792 申请日期 1998.11.30
申请人 HITACHI LTD 发明人 KIYONO TOMOYUKI;CHIYABARA KENICHI;SATO TAKESHI;UMEHARA SATOSHI
分类号 C23C14/35;H01L21/285;(IPC1-7):C23C14/35 主分类号 C23C14/35
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