| 摘要 |
PURPOSE: A method for manufacturing an LCD is provided to prevent a pixel electrode from being disconnected by filling conductive resin into a contact hole so that conductive resin can contact disconnected ITO(Indium Tin Oxide) layers each other. CONSTITUTION: One out of metallic layers, such as aluminum, aluminum alloy, chrome, molybdenum, etc., is selected and deposited on a transparent substrate(111). Photoresist is applied on the metallic layer and developed so that it can become a required pattern. The metallic layer is etched according to the developed pattern so that a gate electrode(117a) can be formed. An anode oxidation layer is formed on the gate electrode(117a). An inorganic insulating layer, an a-Si layer, and an n+ type a-Si layer are deposited and accumulated successively. Photoresist is applied on the n+ type a-Si layer and developed so that it can become a required pattern. The a-Si layer and the an n+ type a-Si layer are etched according to the developed pattern at the same time so that the semiconductor layer(122) and the ohmic contact layer(125) can be formed. A chrome or aluminum metallic layer is deposited on the whole surface of the substrate. Photoresist is applied on the metallic layer and developed. The metallic layer is etched according to the developed pattern so that a source electrode(115a) and a drain electrode(115b) can be formed. Then the n+ type a-Si layer is removed between the source electrode(115a) and the drain electrode(115b). An organic insulating layer, as a protection layer(126), is applied on the whole surface of the substrate. Photoresist is applied on the protection layer and developed so that it can become a required pattern. The protection layer is etched according to the developed pattern so that a contact hole(131) can be formed in a portion of the drain electrode(115b).
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