发明名称 |
GAS DISPERSION PLATE OF SEMICONDUCTOR MANUFACTURING EQUIPMENT |
摘要 |
PURPOSE: A gas dispersion plate is to adjust amount of reaction gas being introduced to inside of a process chamber by adjusting diameter of a hole in the gas dispersion plate. CONSTITUTION: A gas dispersion plate comprises: an upper gas dispersion plate(10) having an upper center hole(12) on its center portion and many upper holes formed around the upper center hole; a lower gas dispersion plate(20) having a lower center hole(22) on its center portion corresponding to the upper center portion and many lower holes corresponding to the upper holes; and a fixing member which keeps the upper and lower gas dispersion plates close and fixes them with being rotatable to each other. The fixing member comprises a connecting groove arranged inside of the upper center hole and a connection(24) extending from the lower center hole outward to be introduced into the connecting groove. The upper or lower center hole further comprises a shutter(14) for closing a given area of the upper or lower center hole in its one side. The upper dispersion plate includes a handle for rotating the upper dispersion plate on a given area thereof.
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申请公布号 |
KR20000021472(A) |
申请公布日期 |
2000.04.25 |
申请号 |
KR19980040570 |
申请日期 |
1998.09.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JEON, JAE HONG |
分类号 |
H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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