发明名称 GAS DISPERSION PLATE OF SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PURPOSE: A gas dispersion plate is to adjust amount of reaction gas being introduced to inside of a process chamber by adjusting diameter of a hole in the gas dispersion plate. CONSTITUTION: A gas dispersion plate comprises: an upper gas dispersion plate(10) having an upper center hole(12) on its center portion and many upper holes formed around the upper center hole; a lower gas dispersion plate(20) having a lower center hole(22) on its center portion corresponding to the upper center portion and many lower holes corresponding to the upper holes; and a fixing member which keeps the upper and lower gas dispersion plates close and fixes them with being rotatable to each other. The fixing member comprises a connecting groove arranged inside of the upper center hole and a connection(24) extending from the lower center hole outward to be introduced into the connecting groove. The upper or lower center hole further comprises a shutter(14) for closing a given area of the upper or lower center hole in its one side. The upper dispersion plate includes a handle for rotating the upper dispersion plate on a given area thereof.
申请公布号 KR20000021472(A) 申请公布日期 2000.04.25
申请号 KR19980040570 申请日期 1998.09.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JEON, JAE HONG
分类号 H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/205
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