发明名称 SCREEN FOR PHOTOMECHANICAL PROCESS, SCREEN FRAME, SCREEN PLATE AND PREPARATION OF SCREEN FRAME
摘要 PROBLEM TO BE SOLVED: To obtain an excellently printed state which is little in moire in a photomechanical process while operational efficiency of the photomechanical process is improved by making the visibility and erasure of the moire easy. SOLUTION: A screen for photomechanical process is colored by at least one color having the same property as that of a positive film 3 (for example, black color) of a dot to be applied in the case where printing is executed in the photomechanical process, or black color. When the screen 1 is used on preparation of a screen frame 6, in the case where the positive film 3 and the screen 1 are mutually superimposed on each other to expose them to a light, a shade of a screen mesh by the light L becomes easy to generate. Therefore, when the positive film 3 is transferred by rotation to the screen 1 along their superimposed surface, a moire to be generated between them becomes easy to generate.
申请公布号 JP2000117936(A) 申请公布日期 2000.04.25
申请号 JP19980297095 申请日期 1998.10.19
申请人 MINOGURUUPU:KK 发明人 NAGASE SHINICHI
分类号 B41F15/36;B41N1/24;H05K3/12;(IPC1-7):B41F15/36 主分类号 B41F15/36
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