ANTISTATIC FILM, MEMBER, ELECTRON BEAM DEVICE USING THIS MEMBER, AND IMAGE FORMING DEVICE

摘要

PROBLEM TO BE SOLVED: To prevent static charge and facilitate removal of the static charge by providing a second film in an island shape or dispersedly on a first film having conductivity so as to partially expose the first film. SOLUTION: An antistatic film 2 is formed on the surface of an insulating member 1 that is a spacer base substance provided with an antistatic process. This antistatic film 2 is constituted with island-shapedly deposited carbon 3 or the island-shapedly deposited carbon 3 and dispersed carbon 4, and a semi- conductive film 5. Coefficient of secondary electron discharge of the antistatic film 2 is lower than that of the semi-conductive film 5 which is partially exposed. The thickness of the semi-conductive film 5 is 10 nm-1μm, the thickness of the antistatic film 2 is 1-10 nm, and conductivity of the antistatic film 2 is preferably lower than that of the semi-conductive film 5. This antistatic film is used for a member in which charge is restrained, an electron beam device using this member, and an image forming device.