Magnetron sputtering apparatus with auxiliary magnetic pole

摘要

A magnetron sputtering apparatus for forming a thin film on a substrate by adhering metal atoms or ions to the substrate comprises: (1) a number of magnetron evaporation sources for metal atoms or ions; and (2) a number of auxiliary magnetic poles; (3) at least one magnetron evaporation source and at least one auxiliary magnetic pole on the circumference of the substrate to generate magnetic force lines surrounding the substrate.