SUBSTRATE HEAT TREATING DEVICE

摘要

PROBLEM TO BE SOLVED: To prevent a concentration gradient from occurring in processing gas and a temperature distribution from occurring in the surface of a substrate in a heat treatment oven by a method wherein an atmosphere shielding member provided with an gas feed opening that feeds processing gas to the center of the substrate is arranged adjacent to the substrate so as to confront it. SOLUTION: A circular atmosphere shielding plate 28 equal in size to the substrate W is arranged adjacent to and above a substrate W held on a susceptor 14 so as to shield all the surface of the substrate W confronting it. The atmosphere shielding plate 28 is formed of quartz or the like, and a gas feed opening 30 that feeds processing gas to the center of the substrate W is provided at the center of the atmosphere shielding plate 28. A gas whirling member 34 that whirls processing gas fed to the center of the substrate W is provided inside a gas feed pipe 32 adjacent to its gas feed opening 30. The gas whirling member 34 is formed like a twisted plate piece.