| 摘要 |
PROBLEM TO BE SOLVED: To prevent a charged particle beam transfer device from being disabled from transfer even when the vibration or speed of a stage is uneven by providing in advance a certain stage adjusting range inside the deflectable range of the pattern beam of a projection optical system and, when the speed of the stage exceeds the stage adjusting range, reducing the deflection of the pattern beam by adjusting the speed of the stage. SOLUTION: In a grain indicating the time sequential transition of the electrical deflection of a projection optical system in the Y-direction when a charged particle beam transfer device makes transfer, the axis of ordinate indicates the Y-direction deflectionΔy of a pattern beam on a wafer and the axis of abscissa indicates the transition of time. The three horizontal solid lines 3 indicate the deflectable range of the optical system. When the deflection of the pattern beam exceeds the range indicated by the two dotted lines 4, the speed of a wafer stage or mask stage is adjusted. The mask stage or wafer stage is controlled in the direction in which the differenceα(on the Y- coordinate) between the position of an image and the transferred position of the image on the wafer becomes closer to zero when the corrected deflection exceeds 0.8Δy so as to make the differenceαzero.
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