| 摘要 |
PURPOSE: A polishing composition is provided to prevent micro projection, micro pit and the other surface defects from forming when finally polishing of a substrate for a memory hard disk. CONSTITUTION: The polishing composition for a memory hard disk has: more than one abrasive among water, aluminum acid, silicon dioxide, serum acid, zirconium acid, titan acid, silicon nitrate and manganese dioxide; succinic acid or it's salt resolved in the composition.
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