| 摘要 |
<p>PROBLEM TO BE SOLVED: To rotate a substrate, such as a silicon wafer in a noncontact condition at a high speed. SOLUTION: A wafer 11 is positioned in an opening 18 which passes through the central part of a holder unit 9, so that the wafer 11 is gripped at its edge. Embedded in the holder unit 5 is a magnet 27. A unit supporting/rotating device 5 includes a thrust support coil 29, a radial support coil 31 and stator coil 33. By utilizing the magnetic forces of the coils, the unit supporting/rotating device 5 supports and rotates the holder unit 9 in a noncontacted condition. Since the coils are disposed close to the holder unit 9, the holder unit 9 can be stably supported and be rotated at a high speed. Furthermore, since the wafer 11 is exposed on its upper and lower sides, treatment fluid can be supplied from a nozzle onto the both surfaces of the wafer 11.</p> |
