| 摘要 |
A charged particle beam column (100) efficiently illuminates a blanking aperture array (108) by splitting a charged particle beam (110) into multiple charged particle beams and focusing each charge particle beam on a separate aperture of the blanking aperture array (108). Where an electron source with a small effective source size is used, for example an electron field emission source or Schottky source, crossovers of the individual beams may occur within the separate apertures of the blanking aperture array. Consequently, no demagnification of the beams passing through the blanking aperture array is necessary to form a small exposure pixel on the writing plane. A beam splitter, shown as biprism (104) is aligned perpendicularly to optical axis (A) and splits electron beam (110) into separate beamlets. |
