发明名称 |
Charged particle beam exposure system and method |
摘要 |
A charged particle beam exposure method including steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array. The blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.
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申请公布号 |
US5977548(A) |
申请公布日期 |
1999.11.02 |
申请号 |
US19960745632 |
申请日期 |
1996.11.08 |
申请人 |
FUJITSU LIMITED |
发明人 |
OAE, YOSHIHISA;ABE, TOMOHIKO;ARAI, SOICHIRO;MARUYAMA, SHIGERU;YASUDA, HIROSHI;MIYAZAWA, KENICHI;KAI, JUNICHI;SATOH, TAKAMASA;BETSUI, KEIICHI;NASUNO, HIDEKI |
分类号 |
H01J37/147;H01J37/30;H01J37/302;H01J37/304;H01J37/317;(IPC1-7):H01J37/304 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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